[1]李洪波,赵学增.基于AFM单晶硅台阶线边缘粗糙度、顶表面和底表面粗糙度的测量[J].南京理工大学学报(自然科学版),2007,(04):478-481.
 LI Hong-bo,ZHAO Xue-zeng.Line Edge Roughness and Top-bottom-surface Roughness Measurement of Single-crystal-silicon Step Using AFM[J].Journal of Nanjing University of Science and Technology,2007,(04):478-481.
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基于AFM单晶硅台阶线边缘粗糙度、顶表面和底表面粗糙度的测量
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《南京理工大学学报》(自然科学版)[ISSN:1005-9830/CN:32-1397/N]

卷:
期数:
2007年04期
页码:
478-481
栏目:
出版日期:
2007-08-30

文章信息/Info

Title:
Line Edge Roughness and Top-bottom-surface Roughness Measurement of Single-crystal-silicon Step Using AFM
作者:
李洪波 赵学增
哈尔滨工业大学机电学院, 黑龙江哈尔滨150001
Author(s):
LI Hong-boZHAO Xue-zeng
Mechanical & Electric School,Harbin Institute of Technology,Harbin 150001,China
关键词:
纳米计量 原子力显微镜 压电驱动器 边缘粗糙度 顶表面和底表面粗糙度
Keywords:
nanoscale measurem ent a tom ic force m icroscope piezoe lectric actuator line edge roughness top-bo ttom-surface roughness
分类号:
TG84
摘要:
采用原子力显微镜以TOP-DOWN方式测量单晶硅刻线单侧形貌。提出以单次扫描线上5个最低测量值的平均值为高度参考点且各条扫描线参考高度在统计意义下相等,校正(原子力显微镜)AFM压电驱动器高度方向非线性。通过NIST高度算法和直方图方法相结合确定样本边缘表面、顶表面和底部表面范围。顶表面和底表面各扫描线的功率谱密度(PSD)、均方根值(RMS)基本一致。对于边缘粗糙度而言,RMS随测量高度增加而减小;PSD随高度增加主导频率范围略有降低但变化不明显。
Abstract:
Single side topography on the single-crysta-l silicon step is measured by AFM ( atom ic force m icroscope) in top-dow nmode. Thew ay to verify the nonlinearity o f the p iezoelectric actuator in AFM is proposed: to regard themean height of the 5 low est po ints in each scan-line as the height reference poin,t and the reference points. height of all scan-lines are equ ivalent to each o ther. Based on this, the non linearity o f the piezoelectric actuator o f AFM is verified. The edge, top and bottom surface range of the sample are determ ined respectively by using theNIST (Nat ional Institute o f Standards and Techno logy) heigh-t a lgorithm integrated w ith histogram. The rootmean square (RMS) and the pow er spectral density ( PSD) of each scan-line roughness on the top-bottom-surfaces are the same. As for the line edge roughness, RMS decreases when the he ight increases, wh ile, the dom inant frequency range o f PSD slightly reduces when the he ight increases, but this change is inconsp icuous

参考文献/References:

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备注/Memo

备注/Memo:
作者简介: 李洪波( 1970 - ), 男, 黑龙江鸡西人, 讲师, 主要研究方向: 纳米计量和机电检测技术, E-ma il: 13614516992@ 126. com;
通讯作者: 赵学增( 1961- ), 男, 教授, 博士生导师, 主要研究方向: 纳米计量和 机电控制技术, E-mail: Zhaoxz@ hope.hit. edu. cn。
更新日期/Last Update: 2007-08-30